|
|
Volumn 20, Issue 3, 2011, Pages 389-394
|
|
Dry etching of diamond nanowires using self-organized metal droplet masks
|
|
Author keywords
Dewetting; Diamond; Etching; Metal
|
|
Indexed keywords
BORON-DOPED POLYCRYSTALLINE DIAMOND;
CAPACITIVELY COUPLED PLASMAS;
DE-WETTING;
DIAMOND NANOWIRES;
DRY ETCHING TECHNIQUES;
ETCH RATES;
ETCHING MASKS;
ICP-RIE;
INDUCTIVELY COUPLED-PLASMA REACTIVE ION ETCHING;
ION ACCELERATIONS;
METAL DROPLETS;
METAL FILM;
METAL LAYER;
OXYGEN PLASMA ETCHING;
PLASMA POWER;
PLATEN POWER;
RANDOMLY DISTRIBUTED;
SELF-ORGANIZED;
SHAPE AND SIZE;
SURFACE DENSITY;
TOP-DOWN APPROACH;
VERTICALLY ALIGNED;
ANISOTROPIC ETCHING;
ANISOTROPY;
BORON;
DIAMONDS;
DRY ETCHING;
GOLD;
INDUCTIVELY COUPLED PLASMA;
IONS;
METALS;
NANOWIRES;
OXYGEN;
PALLADIUM;
PLASMA ETCHING;
PLATINUM;
REACTIVE ION ETCHING;
|
|
EID: 79951583062
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/j.diamond.2011.01.037 Document Type: Article |
|
Times cited : (34)
|
|
References (26)
|
