In situ study of the dewetting behavior of Ni-films on oxidized Si(0 0 1) by GISAXS

Surface Science

Volumn 601, Issue 18, 2007, Pages 4526-4530

  Felici, R ^a   Jeutter, N M ^a   Mussi, V ^b   de Mongeot, F Buatier ^b   Boragno, C ^b   Valbusa, U ^b   Toma, A ^b   Zhang, Y Wei ^c   Rau, C ^c   Robinson, I K ^d  

^a EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^b UNIVERSITY OF GENOA   (Italy)

^c United States of America   (United States)

^d UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

Dewetting; GISAXS; Metal clusters; Nickel; Silicon; Silicon oxide; X ray reflectivity

Indexed keywords

ANNEALING; NICKEL; NUCLEATION; SILICON; SURFACE ROUGHNESS; X RAY SCATTERING;

DEWETTING; DIFFUSED INTENSITY; GRAZING INCIDENCE SMALL ANGLE X RAY SCATTERING; METAL NANOCLUSTERS; REFLECTIVITY PLANES;

METALLIC FILMS;

EID: 34548657155     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2007.04.210     Document Type: Article

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