Plasma interactions with high aspect ratio patterned surfaces: Ion transport, scattering, and the role of charging

Thin Solid Films

Volumn 374, Issue 2, 2000, Pages 175-180

  Giapis, K P ^a   Hwang, G S ^a  

^a California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; MASKS; PLASMA ETCHING; TRANSPORT PROPERTIES;

MICROTRENCHING; SIDEWALL BOWING;

SEMICONDUCTING FILMS;

EID: 0034292308     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01149-4     Document Type: Article

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