General approach for fabricating nanoparticle arrays via patterned block copolymer nanoreactors

Journal of Nanoparticle Research

Volumn 13, Issue 1, 2011, Pages 1-13

  Zu, Xihong ^a,b   Tu, Weiping ^a   Deng, Yulin ^b  

^a SOUTH CHINA UNIVERSITY OF TECHNOLOGY   (China)

^b Georgia Institute of Technology   (United States)

Author keywords

Block copolymer; Nanomanufacturing; Nanoparticle array; Nanoreactor; Patterning

Indexed keywords

4-VINYLPYRIDINE; AU NANOPARTICLE; CENTER DISTANCE; DIBLOCK COPOLYMER; DIBLOCK COPOLYMER THIN FILMS; DIHYDRATES; DOUBLE DECOMPOSITION; GENERAL APPROACH; HOMOPOLYMERS; IN-SITU; NANO DOMAIN; NANO-MANUFACTURING; NANOPARTICLE ARRAY; NON-SOLVENTS; OVER THE AIRS; PATTERNING; PS-B-P4VP; SILICON SUBSTRATES; SODIUM CITRATE; THERMAL DECOMPOSITIONS; TWO-STEP CALCINATION; ZNO;

BLOCK COPOLYMERS; CALCINATION; COPOLYMERIZATION; METHANOL; NANOPARTICLES; NANOREACTORS; ORGANIC SOLVENTS; PLASTIC PRODUCTS; POLYSTYRENES; PYROLYSIS; SODIUM; STYRENE; THIN FILMS; ZINC OXIDE;

GOLD;

CITRATE SODIUM; COPOLYMER; GOLD NANOPARTICLE; NANOREACTOR; POLY(STYRENE B 4 VINYLPYRIDINE); POLYSTYRENE; SILICON; UNCLASSIFIED DRUG;

DECOMPOSITION; FILM; HYDROLYSIS; NANOFABRICATION; OXIDATION REDUCTION REACTION; PRECIPITATION; PRIORITY JOURNAL; REVIEW;

EID: 79551613558     PISSN: 13880764     EISSN: 1572896X     Source Type: Journal    
DOI: 10.1007/s11051-010-0059-3     Document Type: Review

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