Characterization of hydrogenated amorphous carbon thin films by end-Hall ion beam deposition

Applied Surface Science

Volumn 257, Issue 10, 2011, Pages 4699-4705

  Tang, Y ^a   Li, Y S ^a   Yang, Q ^a   Hirose, A ^a  

^a UNIVERSITY OF SASKATCHEWAN   (Canada)

Author keywords

Amorphous carbon; End Hall ion source; Ion beam deposition

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON FILMS; ELASTIC MODULI; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDNESS; HYDROGENATION; ION BEAM ASSISTED DEPOSITION; ION BEAMS; ION SOURCES; MECHANICAL PROPERTIES; METALLIC FILMS; SCANNING PROBE MICROSCOPY; SEMICONDUCTOR DOPING; X RAY PHOTOELECTRON SPECTROSCOPY;

BEAM ENERGIES; END-HALL ION SOURCE; HIGH HARDNESS; HYDROGENATED AMORPHOUS CARBON; ION BEAM DEPOSITION; MICROSTRUCTURE AND MECHANICAL PROPERTIES; NITROGEN-DOPED; ROOT MEAN SQUARE ROUGHNESS;

THIN FILMS;

EID: 79551522174     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.12.129     Document Type: Article

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