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Volumn 16, Issue 2, 2007, Pages 220-224

Diamond-like carbon films with End-Hall ion source enhanced chemical vapour deposition

Author keywords

Diamond like carbon films; End Hall ion source; Infrared transmission enhancement; PECVD

Indexed keywords

GERMANIUM; INFRARED TRANSMISSION; ION BOMBARDMENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SILICON WAFERS;

EID: 33846279059     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.05.003     Document Type: Article
Times cited : (11)

References (19)
  • 13
    • 0003494870 scopus 로고
    • Vossen J., and Kern W. (Eds), Academic Press, New York
    • Thornton J., and Penfold A. In: Vossen J., and Kern W. (Eds). Thin Film Processes (1978), Academic Press, New York
    • (1978) Thin Film Processes
    • Thornton, J.1    Penfold, A.2
  • 19
    • 33846281521 scopus 로고    scopus 로고
    • T. Fang, W. Chang, Applied Surface Science, in press, online available since September 23, 2005.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.