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Volumn 1321, Issue , 2010, Pages 1-8

Japan's contributions to ion beam technologies

Author keywords

cluster ion; IIT; ion implantation; polyatomic ion; semiconductor industry; surface modification

Indexed keywords


EID: 79251563430     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.3548348     Document Type: Conference Paper
Times cited : (5)

References (34)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.