Concepts and designs of ion implantation equipment for semiconductor processing

Review of Scientific Instruments

Volumn 77, Issue 11, 2006, Pages

  Rose, Peter H ^a   Ryding, Geoffrey ^b  

^a Epion Corporation   (United States)

^b Applied Materials Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON DEVICE MANUFACTURE; ION BEAMS; ISOTOPES; NUCLEAR PHYSICS; PARTICLE ACCELERATORS; SEMICONDUCTOR DOPING;

AUTOMATED HANDLING SYSTEMS; BEAM TRANSPORT SYSTEMS;

ION IMPLANTATION;

EID: 33751576187     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2354571     Document Type: Article

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