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Volumn 866, Issue , 2006, Pages 147-154

20 years history of fundamental research on gas cluster ion beams, and current status of the applications to industry

Author keywords

Cluster ion beams; Lateral sputtering; Shallow implantation; Surface smoothing

Indexed keywords


EID: 33846959478     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2401482     Document Type: Conference Paper
Times cited : (5)

References (16)
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    • Japan Science and Technology Agency (JST) Project completed on 2005-06-18.
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    • D.Jacobson, Extended abstracts of the fifth international workshop on junction technology, June 7-8 2005, Osaka Japan, Japan Society of Applied Physics/Silicon Technology division. IEEE, (2005) p23
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.