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Volumn 98, Issue 3, 2011, Pages
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Direct observation of the 1/E dependence of time dependent dielectric breakdown in the presence of copper
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Author keywords
[No Author keywords available]
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Indexed keywords
BARRIER MATERIAL;
DATA EXTRAPOLATION;
DIRECT OBSERVATION;
E-MODEL;
FIELD ACCELERATION;
METAL INSULATOR SEMICONDUCTOR CAPACITORS;
POWER LAW MODEL;
SILICON DIOXIDE;
TDDB LIFETIME;
TIME DEPENDENT DIELECTRIC BREAKDOWN;
TIME TO FAILURE;
TIME-DEPENDENT DIELECTRIC BREAKDOWN LIFETIMES;
ELECTRIC BREAKDOWN;
ELECTRIC FIELD MEASUREMENT;
ELECTRIC FIELDS;
METAL INSULATOR BOUNDARIES;
MIS DEVICES;
SEMICONDUCTING SILICON;
SEMICONDUCTING SILICON COMPOUNDS;
SILICA;
DIELECTRIC MATERIALS;
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EID: 79251554418
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.3543850 Document Type: Article |
Times cited : (51)
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References (16)
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