A novel test structure to study intrinsic reliability of barrier/low-k

IEEE International Reliability Physics Symposium Proceedings

Volumn , Issue , 2009, Pages 848-850

  Zhao, Larry ^a   Tokei, Zsolt ^b   Gischia, Gianni Giai ^b   Pantouvaki, Marianna ^b   Croes, Kristof ^b   Beyer, Gerald ^b  

^a Intel Corporation Belgium   (Belgium)

^b IMEC   (Belgium)

Author keywords

Barrier; CDO; Cu; CuMn; Interconnect; Low k; Planar capacitor; Reliability; TDDB; Test structure

Indexed keywords

BARRIER; CDO; CU; CUMN; INTERCONNECT; LOW-K; PLANAR CAPACITOR; TDDB; TEST STRUCTURE;

CAPACITANCE; COPPER; RELIABILITY; TESTING;

CAPACITORS;

EID: 70449106985     PISSN: 15417026     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IRPS.2009.5173364     Document Type: Conference Paper

References (5)

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4. M. Stucchi et al. IIEE-IITC Proceedings, 2008, pp. 174-176
5. J.R. Lloyd et al., IEEE-IRPS Proceedings, 2007, pp. 410-411.