High-mobility copper-phthalocyanine field-effect transistors with tetratetracontane passivation layer and organic metal contacts

Journal of Applied Physics

Volumn 107, Issue 9, 2010, Pages

  Kraus, Michael ^a   Richler, Stefan ^a   Opitz, Andreas ^a   Brütting, Wolfgang ^a   Haas, Simon ^b   Hasegawa, Tatsuo ^b   Hinderhofer, Alexander ^c   Schreiber, Frank ^c  

^a UNIVERSITY OF AUGSBURG   (Germany)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c UNIVERSITY OF TÜBINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE MATERIAL; AMBIPOLAR; CHARGE TRANSPORT; COPPER-PHTHALOCYANINE; CRYSTALLINE LAYERS; CRYSTALLINITIES; HIGH ELECTRON MOBILITY; HIGH MOBILITY; HOLE TRANSPORTS; LONG CHAIN ALKANE; ORDER OF MAGNITUDE; ORGANIC CHARGE; ORGANIC METALS; PASSIVATION LAYER; SILICON DIOXIDE; TOP CONTACT; TRANSMISSION LINE METHODS;

ATOMIC FORCE MICROSCOPY; CHARGE TRANSFER; ELECTRON MOBILITY; NITROGEN COMPOUNDS; ORGANIC CONDUCTORS; ORGANIC FIELD EFFECT TRANSISTORS; PARAFFINS; PASSIVATION; SILICA; SILICON OXIDES; SINGLE CRYSTALS; X RAY DIFFRACTION;

FIELD EFFECT TRANSISTORS;

EID: 79251526860     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3354086     Document Type: Article

References (40)

1. H. Sirringhaus, Adv. Mater. ADVMEW 0935-9648 17, 2411 (2005). 10.1002/adma.200501152 (Pubitemid 41504967)
2. A. Babel, J. D. Wind, and S. A. Jenehke, Adv. Funct. Mater. AFMDC6 1616-301X 14, 891 (2004). 10.1002/adfm.200305180
3. J. Zaumseil, R. H. Friend, and H. Sirringhaus, Nature Mater. NMAACR 1476-1122 5, 69 (2006). 10.1038/nmat1537 (Pubitemid 43049391)
4. N. Karl, in Organic Semiconductors, Landolt-Boernstein (New Series) Chap. Organic Semiconductors, Group III, Vol. 41E, edited by, O. Madelung, M. Schulz, and, H. Weiss, (Springer, Berlin, 2000).
5. L. L. Chua, J. Zaumseil, J. F. Chang, E. C. W. Ou, P. K. H. Ho, H. Sirringhaus, and R. H. Friend, Nature (London) NATUAS 0028-0836 434, 194 (2005). 10.1038/nature03376 (Pubitemid 40388045)
6. T. Yasuda, T. Goto, K. Fujita, and T. Tsutsui, Appl. Phys. Lett. APPLAB 0003-6951 85, 2098 (2004). 10.1063/1.1794375
7. E. J. Meijer, D. M. De Leeuw, S. Setayesh, E. Van Veenendaal, B. H. Huisman, P. W. M. Blom, J. C. Hummelen, U. Scherf, and T. M. Klapwijk, Nature Mater. NMAACR 1476-1122 2, 678 (2003). 10.1038/nmat978
8. A. Opitz, M. Bronner, and W. Brütting, J. Appl. Phys. JAPIAU 0021-8979 101, 063709 (2007). 10.1063/1.2436836 (Pubitemid 46517019)
9. M. Ahles, R. Schmechel, and H. v. Seggern, Appl. Phys. Lett. APPLAB 0003-6951 87, 113505 (2005). 10.1063/1.2045556 (Pubitemid 41330907)
10. A. Opitz, M. Kraus, M. Bronner, J. Wagner, and W. Brütting, New J. Phys. NJOPFM 1367-2630 10, 065006 (2008). 10.1088/1367-2630/10/6/065006
11. S. Ogawa, Y. Kimura, M. Niwano, and H. Ishii, Appl. Phys. Lett. APPLAB 0003-6951 90, 033504 (2007). 10.1063/1.2431713 (Pubitemid 46146400)
12. K. Yamaguchi, S. Takamiya, M. Minami, Y. Doge, Y. Nishide, H. Osuga, K. Uno, and I. Tanaka, Appl. Phys. Lett. APPLAB 0003-6951 93, 043302 (2008). 10.1063/1.2958341
13. X. Cheng, Y. -Y. Noh, J. Wang, M. Tello, J. Frisch, R. -P. Blum, A. Vollmer, J. Rabe, N. Koch, and H. Sirringhaus, Adv. Funct. Mater. AFMDC6 1616-301X 19, 2407 (2009). 10.1002/adfm.200900315
14. G. Parthasarathy, P. E. Burrows, V. Khalfin, V. G. Kozlov, and S. R. Forrest, Appl. Phys. Lett. APPLAB 0003-6951 72, 2138 (1998). 10.1063/1.121301 (Pubitemid 128671360)
15. A. C. Dürr, F. Schreiber, M. Kelsch, H. D. Carstanjen, and H. Dosch, Adv. Mater. ADVMEW 0935-9648 14, 961 (2002).
16. A. C. Dürr, F. Schreiber, M. Kelsch, H. D. Carstanjen, H. Dosch, and O. H. Seeck, J. Appl. Phys. JAPIAU 0021-8979 93, 5201 (2003). 10.1063/1.1556180
17. D. J́rome and H. Schulz, Adv. Phys. ADPHAH 0001-8732 31, 299 (1982). 10.1080/00018738200101398
18. Y. Takahashi, T. Hasegawa, Y. Tokura, K. Nishimura, and G. Saito, Appl. Phys. Lett. APPLAB 0003-6951 86, 063504 (2005). 10.1063/1.1863434 (Pubitemid 40870879)
19. Y. Takahashi, T. Hasegawa, Y. Abe, Y. Tokura, and G. Saito, Appl. Phys. Lett. APPLAB 0003-6951 88, 073504 (2006). 10.1063/1.2173226 (Pubitemid 43261865)
20. S. Luan and G. W. Neudeck, J. Appl. Phys. JAPIAU 0021-8979 72, 766 (1992). 10.1063/1.351809
21. J. -P. Gorce, S. Spells, X. -B. Zeng, and G. Ungar, J. Phys. Chem. B JPCBFK 1089-5647 108, 3130 (2004). 10.1021/jp030794e
22. N. Abiko, K. Sugi, T. Suenaga, Y. Kimura, H. Ishii, and M. Niwano, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 45, 442 (2006). 10.1143/JJAP.45.442 (Pubitemid 43185046)
23. L. G. Parratt, Phys. Rev. PRVAAH 0096-8250 95, 359 (1954). 10.1103/PhysRev.95.359
24. O. Berger, W. -J. Fischer, B. Adolphi, S. Tierbach, V. Melev, and J. Schreiber, J. Mater. Sci.: Mater. Electron. JSMEEV 0957-4522 11, 331 (2000). 10.1023/A:1008933516940
25. A. Hoshino, Y. Takenaka, and H. Miyaji, Acta Crystallogr. B 59, 393 (2003). 10.1107/S010876810300942X 0108-7681
26. C. K. Song, B. W. Koo, S. B. Lee, and D. H. Kim, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 41, 2730 (2002). 10.1143/JJAP.41.2730 (Pubitemid 43225641)
27. J. Veres, S. Ogier, G. Lloyd, and D. de Leeuw, Chem. Mater. CMATEX 0897-4756 16, 4543 (2004). 10.1021/cm049598q
28. S. Grecu, M. Roggenbuck, A. Opitz, and W. Brütting, Org. Electron. OERLAU 1566-1199 7, 276 (2006). 10.1016/j.orgel.2006.03.005 (Pubitemid 44416336)
29. R. W. I. de Boer, A. F. Stassen, M. F. Craciun, C. L. Mulder, A. Molinari, S. Rogge, and A. F. Morpurgo, Appl. Phys. Lett. APPLAB 0003-6951 86, 262109 (2005). 10.1063/1.1984093 (Pubitemid 40983207)
30. I. N. Hulea, S. Fratini, H. Xie, C. L. Mulder, N. N. Iossad, G. Rastelli, S. Ciuchi, and A. F. Morpurgo, Nature Mater. NMAACR 1476-1122 5, 982 (2006). 10.1038/nmat1774 (Pubitemid 44847496)
31. K. Shibata, K. Ishikawa, H. Takezoe, H. Wada, and T. Mori, Appl. Phys. Lett. APPLAB 0003-6951 92, 023305 (2008). 10.1063/1.2834374
32. S. Haas, Y. Takahashi, K. Takimiya, and T. Hasegawa, Appl. Phys. Lett. APPLAB 0003-6951 95, 022111 (2009). 10.1063/1.3183509
33. O. V. Molodtsova, T. Schwieger, and M. Knupfer, Appl. Surf. Sci. ASUSEE 0169-4332 252, 143 (2005). 10.1016/j.apsusc.2005.02.023 (Pubitemid 41282699)
34. S. Krause, M. B. Casu, A. Scholl, and E. Umbach, New J. Phys. NJOPFM 1367-2630 10, 085001 (2008). 10.1088/1367-2630/10/8/085001
35. K. Shibata, H. Wada, K. Ishikawa, H. Takezoe, and T. Mori, Appl. Phys. Lett. APPLAB 0003-6951 90, 193509 (2007). 10.1063/1.2738379 (Pubitemid 46738153)
36. L. Yan, N. J. Watkins, S. Zorba, Y. Gao, and C. W. Tang, Appl. Phys. Lett. APPLAB 0003-6951 79, 4148 (2001). 10.1063/1.1426260 (Pubitemid 34023329)
37. L. Lozzi, S. Santucci, and S. L. Rosa, J. Vac. Sci. Technol. A JVTAD6 0734-2101 22, 1477 (2004). 10.1116/1.1701860
38. N. Koch, ChemPhysChem CPCHFT 1439-4235 8, 1438 (2007). 10.1002/cphc.200700177
39. M. Scharnberg, J. Hu, J. Kanzow, K. Rätzke, R. Adelung, F. Faupel, C. Pannemann, U. Hilleringmann, S. Meyer, and J. Pflaum, Appl. Phys. Lett. APPLAB 0003-6951 86, 024104 (2005). 10.1063/1.1849845 (Pubitemid 40211696)
40. J. G. Xue, B. P. Rand, S. Uchida, and S. R. Forrest, J. Appl. Phys. JAPIAU 0021-8979 98, 124903 (2005). 10.1063/1.2142073 (Pubitemid 43032148)