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Volumn 108, Issue 11, 2010, Pages

Microstructural and dielectric properties of Ba0.6 Sr 0.4 Ti1-x Zrx O3 based combinatorial thin film capacitors library

(7) Liu, Guozhen a Wolfman, J́rôme a Autret Lambert, Ćcile a Sakai, Joe a Roger, Sylvain a Gervais, Monique a Gervais, Fraņois a

a UNIVERSITÉ DE TOURS (France)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITIVE MEASUREMENTS; CHEMICAL PRESSURES; COMBINATORIAL THIN FILMS; COMPLEX EVOLUTIONS; COMPOSITION-SPREAD THIN FILMS; ELASTIC ENERGY; ENERGY DISPERSIVE X RAY SPECTROSCOPY; EPITAXIAL STRESS; MICRO-STRUCTURAL; MICROSTRUCTURAL PROPERTIES; SRTIO; TUNABILITIES; ZR-DOPING;

BARIUM; EPITAXIAL GROWTH; PERMITTIVITY; PROGRAMMABLE LOGIC CONTROLLERS; PULSED LASER DEPOSITION; THIN FILM CIRCUITS; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY SPECTROSCOPY; ZIRCONIUM;

ZIRCONIUM COMPOUNDS;

EID: 78751561061 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3514153 Document Type: Article

Times cited : (17)

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