Crystallized nano-thick ZnO films with low temperature ALD process

Journal of Korean Institute of Metals and Materials

Volumn 48, Issue 12, 2010, Pages 1109-1115

  Yu, Byungkwan ^a   Han, Jeungjo ^a   Song, Ohsung ^a  

^a University of Seoul   (South Korea)

Author keywords

ALD; Crystallinity; Deposition; Thin films; X ray diffraction

Indexed keywords

AFM; ALD; AMORPHOUS ZNO; BAND GAPS; CARBON IMPURITIES; CHEMICAL COMPOSITIONS; CROSS-SECTIONAL TEM; CRYSTALLINITIES; DIETHYL ZINC; LOW TEMPERATURES; MICROSTRUCTURE EVOLUTIONS; PHASE FORMATIONS; SEM; SI (100) SUBSTRATE; SUBSTRATE TEMPERATURE; TEM; UV ABSORBANCE; UV-VIS-NIR; XRD; ZNO FILMS; ZNO LAYERS; ZNO THIN FILM;

AMORPHOUS FILMS; ATOMIC LAYER DEPOSITION; DEPOSITION; DIFFRACTION; METALLIC FILMS; SEMICONDUCTING SILICON COMPOUNDS; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION; ZINC OXIDE;

VAPOR DEPOSITION;

EID: 78751507916     PISSN: 17388228     EISSN: None     Source Type: Journal    
DOI: 10.3365/KJMM.2010.48.12.1109     Document Type: Article

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