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Volumn 108, Issue 11, 2010, Pages

Effects of the intermediate SiO2 layer on polarized output of a light-emitting diode with surface plasmon coupling

Author keywords

[No Author keywords available]

Indexed keywords

COUPLING EFFECT; EPITAXIAL STRUCTURE; FAR-FIELD DIFFRACTION; GAN LAYERS; GRATING PERIODS; GRATING STRUCTURES; INGAN/GAN QUANTUM WELL; INTERMEDIATE LAYERS; NEAR-FIELD; NEAR-FIELD DISTRIBUTION; OUTPUT INTENSITY; POLARITONS; POLARIZATION RATIOS; SIMULATION RESULT; SURFACE PLASMON COUPLING; SURFACE PLASMONS;

EID: 78751471738     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3517082     Document Type: Article
Times cited : (38)

References (24)
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  • 2
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    • Polarization of light emission by 460 nm GaInNGaN light-emitting diodes grown on (0001) oriented sapphire substrates
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  • 6
    • 17944381225 scopus 로고    scopus 로고
    • Polarization anisotropy in the electroluminescence of m-plane InGaN-GaN multiple-quantum-well light-emitting diodes
    • DOI 10.1063/1.1875765, 111101
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  • 9
    • 40549121285 scopus 로고    scopus 로고
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  • 14
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  • 16
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.