The effect of UV-assisted cleaning on the performance and stability of amorphous oxide semiconductor thin-film transistors under illumination

Applied Physics Letters

Volumn 98, Issue 1, 2011, Pages

  Park, Joon Seok ^a   Kim, Tae Sang ^a   Son, Kyoung Seok ^a   Maeng, Wan Joo ^a   Kim, Hyun Suk ^a   Ryu, Myungkwan ^a   Lee, Sang Yoon ^a  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE LAYER; AMORPHOUS OXIDE SEMICONDUCTORS; AMORPHOUS OXIDES; DEVICE DEGRADATION; NEGATIVE BIAS; NEGATIVE V; OXIDE SEMICONDUCTOR; PHOTOGENERATED HOLES; PROCESS STEPS; TRAPPING SITES; ULTRA-VIOLET; UV CLEANING; UV RADIATION;

AMORPHOUS FILMS; CLEANING; THIN FILM TRANSISTORS; ULTRAVIOLET RADIATION;

SEMICONDUCTOR GROWTH;

EID: 78651305125     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3536479     Document Type: Article

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