Feasibility of UV cleaning of 157-nm reticles

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 3-9

  Duisterwinkel, A E ^a   Bastein, A T G M ^a   Van Schaik, W ^b  

^a TNO   (Netherlands)

^b ASML   (Netherlands)

Author keywords

157 nm lithography; Contamination control; Molecular contamination; Reticle; Transmission loss; UV cleaning

Indexed keywords

HYDROCARBONS; PROBLEM SOLVING; PURGING; ULTRAVIOLET RADIATION;

TRANSMISSION LOSS;

LITHOGRAPHY;

EID: 0037683147     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00166-7     Document Type: Conference Paper

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