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Scripta Materialia

Volumn 64, Issue 6, 2011, Pages 490-493

Thermoelastic switching with controlled actuation in VO2 thin films

(3) Viswanath, B a Ko, Changhyun a Ramanathan, Shriram a

a HARVARD UNIVERSITY (United States)

Author keywords

Martensitic phase transformation; Microelectromechanical systems; Recoverable stress; Stress relaxation; Thin film

Indexed keywords

IN-SITU; MARTENSITIC PHASE TRANSFORMATIONS; MARTENSITIC TRANSITIONS; MICROELECTROMECHANICAL SYSTEMS; RECOVERABLE STRESS; STRESS CHANGES; THERMOELASTICS; TRANSITION TEMPERATURE; TRIGGERED PHASE TRANSITION; VANADIUM DIOXIDE THIN FILMS; WAFER CURVATURE MEASUREMENT;

COMPOSITE MICROMECHANICS; MARTENSITE; MECHATRONICS; MEMS; MICROELECTROMECHANICAL DEVICES; RESIDUAL STRESSES; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; STRESS RELAXATION; THIN FILMS; VANADIUM;

MARTENSITIC TRANSFORMATIONS;

EID: 78651269341 PISSN: 13596462 EISSN: None Source Type: Journal
DOI: 10.1016/j.scriptamat.2010.11.018 Document Type: Article

Times cited : (34)

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