Effects of crystallinity and chemical variation on apparent band-gap shift in polycrystalline indium nitride

Thin Solid Films

Volumn 519, Issue 6, 2011, Pages 1831-1836

  Chen, P P T ^a   Downes, J E ^a   Fernandes, A J ^a   Butcher, K S A ^a   Wintrebert Fouquet, M ^a   Wuhrer, R ^b   Phillips, M R ^b  

^a MACQUARIE UNIVERSITY   (Australia)

^b UNIVERSITY OF TECHNOLOGY SYDNEY   (Australia)

Author keywords

Band gap; Chemical variation; Crystallinity; Excess nitrogen; Indium nitride; Lattice parameters; Surface oxide

Indexed keywords

BAND GAPS; CHEMICAL VARIATION; CRYSTALLINITIES; EXCESS NITROGEN; INDIUM NITRIDE; LATTICE PARAMETERS; SURFACE OXIDE;

CRYSTALLITES; GALLIUM ALLOYS; GALLIUM NITRIDE; GROWTH TEMPERATURE; LATTICE CONSTANTS; LIGHT TRANSMISSION; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SAPPHIRE; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

INDIUM;

EID: 78651228583     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.10.013     Document Type: Article

References (22)

1. M. Xiaodong, Y.J. Ding, W. Wang, D. Jena, and Y.B. Zotova Opt. Lett. 32 2007 1423
2. S.J. Chang, C.F. Shen, W.S. Chen, C.T. Kuo, T.K. Ko, S.C. Shei, and J.K. Sheu Appl. Phys. Lett. 91 2007 013504
3. S.C.P. Rodrigues, M.N. d'Eurydice, G.M. Sipahi, L.M.R. Scolfaro, and E.F. da Silva J. Appl. Phys. 101 2007 113706
4. M.C. Schmidt, K.-C. Kim, R.M. Farrell, D.F. Feezell, D.A. Cohen, M. Saito, K. Fujito, J.S. Speck, S.P. Denbaars, and S. Nakamura Jpn. J. Appl. Phys. 46 2007 L190
5. Y.-S. Lin, S.-H. Koa, C.Y. Chan, S.S.H. Hsua, H.M. Lee, and S. Gwo Appl. Phys. Lett. 90 2007 142111
6. T.L. Tansley, and C.P. Foley Electron. Lett. 20 1984 1066
7. Q.X. Guo, T. Tanaka, M. Nishio, H. Ogawa, X.D. Pu, and W.Z. Shen Appl. Phys. Lett. 86 2005 231913
8. V.Yu. Davydov, A.A. Klochikhin, R.P. Seisyan, V.V. Emtsev, S.V. Ivanov, F. Bechstedt, J. Furthmuller, H. Harima, A.V. Mudryi, J. Aderhold, O. Semchinova, and J. Graul Phys. Status Solidi B 229 2002 R1
9. J. Wu, W. Walukiewicz, K.M. Yu, J.W. Ager III, E.E. Haller, H. Lu, W.J. Schaff, Y. Saito, and Y. Nanishi Appl. Phys. Lett. 80 2002 3967
10. P.P.-T. Chen, K.S.A. Butcher, M. Wintrebert-Fouquet, R. Wuhrer, M.R. Phillips, K.E. Prince, H. Timmers, S.K. Shrestha, and B.F. Usher J. Cryst. Growth 288 2006 241
11. J.A. Miragliotta J.H. Edgar, Properties of Group III Nitrides 1994 INSPEC London 192
12. J.B. Nelson, and D.P. Riley Proc. Phys. Soc. 57 1944 160
13. J.F. Moulder, W.F. Stickle, P.E. Sobol, and K.D. Bomben J. Chastain, Handbook of X-ray Photoelectron Spectroscopy 1992 Perkin-Elmer Corporation, Physical Electronics Division, Eden Prairie Minnesota, U.S.A 22
14. P. Specht, R. Armitage, J. Ho, E. Gunawan, Q. Yang, X. Xu, C. Kisielowski, and E.R. Weber J. Cryst. Growth 269 2004 111
15. K.S.A. Butcher, A.J. Fernandes, P.P.-T. Chen, M. Wintrebert-Fouquet, H. Timmers, S.K. Shrestha, H. Hirshy, R.M. Perks, and B.F. Usher J. Appl. Phys. 101 2007 123702
16. J.F. Moulder, W.F. Stickle, P.E. Sobol, and K.D. Bomben J. Chastain, Handbook of X-ray Photoelectron Spectroscopy 1992 Perkin-Elmer Corporation, Physical Electronics Division, Eden Prairie Minnesota, U.S.A p. 224
17. T.M. Mok, and S.K. O'Leary J. Appl. Phys. 102 2007 113525
18. P.P.-T. Chen, K.S.A. Butcher, E.M. Goldys, T.L. Tansley, and K.E. Prince Thin Solid Films 496 2006 342
19. S.K. Shrestha, H. Timmers, K.S.A. Butcher, M. Wintrebert-Fouquet, and P.P.-T. Chen Nucl. Instrum. Methods Phys. Res., Sect. B 234 2005 291
20. R. Kosiba, G. Ecke, V. Cimalla, L. Spieß, S. Krischok, J.A. Schaefer, O. Ambacher, and W.J. Schaff Nucl. Instrum. Methods Phys. Res., Sect. B 215 2004 486
21. K.S.A. Butcher, H. Hirshy, R.M. Perks, M. Wintrebert-Fouquet, and P.P.-T. Chen Phys. Status Solidi A 203 2006 66
22. H. Timmers, K.S.A. Butcher, S.K. Shrestha, P.P.-T. Chen, M. Wintrebert-Fouquet, and R. Dogr J. Cryst. Growth 288 2006 236