Multiclass flow line models of semiconductor manufacturing equipment for fab-level simulation

IEEE Transactions on Automation Science and Engineering

Volumn 8, Issue 1, 2011, Pages 81-94

  Morrison, James R ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Fab level simulation; flow line; photolithography cluster tools; semiconductor manufacturing automation

Indexed keywords

BATCH ARRIVALS; CLASS OF SERVICE; EQUIPMENT MODELS; EVOLUTION EQUATIONS; FAB-LEVEL SIMULATION; LOCATION DEPENDENTS; MULTI-CLASS; ORDER OF MAGNITUDE; RECURSIONS; SEMICONDUCTOR MANUFACTURING;

INDUSTRIAL APPLICATIONS; MANUFACTURE; PHOTOLITHOGRAPHY; SILICON WAFERS; TOOLS;

FLOW SIMULATION;

EID: 78651075546     PISSN: 15455955     EISSN: None     Source Type: Journal    
DOI: 10.1109/TASE.2010.2043733     Document Type: Article

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