Influence of krypton atoms on the structure of hydrogenated amorphous carbon deposited by plasma enhanced chemical vapor deposition

Journal of Applied Physics

Volumn 108, Issue 12, 2010, Pages

  Oliveira Jr , M H ^a,b,c   Viana, G A ^a   De Lima Jr , M M ^b   Cros, A ^b   Cantarero, A ^b   Marques, F C ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

^b UNIVERSITY OF VALENCIA   (Spain)

^c PAUL DRUDE INSTITUT FÜR FESTKÖRPERELEKTRONIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

A-C:H FILMS; CATHODE ELECTRODES; FILM STRUCTURE; HYDROGEN CONCENTRATION; HYDROGENATED AMORPHOUS CARBON; HYDROGENATED AMORPHOUS CARBON (A-C:H); ION ENERGIES; KRYPTON ATOMS; MULTIWAVELENGTH; OPTICAL TRANSMISSION SPECTROSCOPY; RUTHERFORD BACK-SCATTERING; SUBPLANTATION;

AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON FILMS; CONCENTRATION (PROCESS); FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; HYDROGENATION; KRYPTON; LIGHT TRANSMISSION; METHANE; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

OPTICAL FILMS;

EID: 78650902781     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3526000     Document Type: Article

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