Pressure-induced physical changes of noble gases implanted in highly stressed amorphous carbon films

Physical Review B - Condensed Matter and Materials Physics

Volumn 68, Issue 5, 2003, Pages

  Lacerda, G ^a   Dos Santos, C ^a   Tessler, R ^a   Hammer, P ^a   Alvarez, F ^a   Marques, C ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; AROMATIC COMPOUND; CARBON; INERT GAS; KRYPTON; XENON;

AB INITIO CALCULATION; ARTICLE; ATOM; CHEMICAL BINDING; ENERGY; FILM; MECHANICAL STRESS; NEAR EDGE X RAY ABSORPTION SPECTROSCOPY; PHYSICAL PARAMETERS; PRESSURE; SPECTROSCOPY;

EID: 12344318930     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.68.054104     Document Type: Article

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