Evaluation of resonating Si cantilevers sputter-deposited with AlN piezoelectric thin films for mass sensing applications

Journal of Micromechanics and Microengineering

Volumn 20, Issue 6, 2010, Pages

  Sokmen U ^a   Stranz, A ^a   Waag, A ^a   Ababneh, A ^b   Seidel, H ^b   Schmid, U ^c   Peiner, E ^a  

^a TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

^b SAARLAND UNIVERSITY   (Germany)

^c VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

ALN; ALUMINIUM NITRIDE; DRY ETCHING PROCESS; E BEAM EVAPORATION; GEOMETRICAL DIMENSIONS; MASS SENSING; MASS SENSITIVITY; PIEZOELECTRIC THIN FILMS; QUALITY FACTORS; RESONANCE FREQUENCIES; SILICON CANTILEVER; SILICON SUBSTRATES; THIN FILM ACTUATOR;

ALUMINUM COMPOUNDS; ELECTROMAGNETIC INDUCTION; INDUCTIVELY COUPLED PLASMA; NANOCANTILEVERS; NITRIDES; PIEZOELECTRICITY; PLASMA ETCHING; RESONANCE; THIN FILMS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 78650868751     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/20/6/064007     Document Type: Article

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