Effects of surface properties of different substrates on fine structure of plasma-polymerized SiOCH films prepared from hexamethyldisiloxane (HMDSO)

Langmuir

Volumn 26, Issue 22, 2010, Pages 17470-17476

  Lo, Chia Hao ^a   Liao, Kuo Sung ^a   De Guzman, Manuel ^a   Rouessac, Vincent ^b   Wei, Ta Chin ^a   Lee, Kueir Rarn ^a   Lai, Juin Yih ^a  

^a CHUNG YUAN CHRISTIAN UNIVERSITY   (Taiwan)

^b UNIVERSITÉ DE MONTPELLIER   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYSIS RESULTS; CELLULOSE ESTERS; DIFFERENT SUBSTRATES; DOPPLER BROADENING; ENERGY SPECTROSCOPY; FINE STRUCTURES; GAS SEPARATIONS; HEXAMETHYL DISILOXANE; LAYER BY LAYER; MACROSTRUCTURES; MEAN PORE SIZE; NODULAR STRUCTURES; S -PARAMETERS; SEM; SIOC-H FILM; SLOW POSITRON BEAM; SUBSTRATE TYPES; SURFACE PORES; THREE-LAYER; TRANSITION LAYERS;

CELLULOSE FILMS; ESTERS; PLASMA POLYMERIZATION; PLASMAS; POLYMERS; PORE SIZE; SUBSTRATES; SURFACE PROPERTIES;

GAS PERMEABLE MEMBRANES;

CELLULOSE FILM; ESTERS; GAS; MEMBRANES; POLYMERS; PORE SIZE; SUBSTRATES; SURFACE PROPERTIES;

EID: 78650340384     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la102759b     Document Type: Article

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