Formation and escaping of positronium in porous SiO 2 films at low temperature

Applied Surface Science

Volumn 255, Issue 1, 2008, Pages 191-193

  Mariazzi, S ^a   Toniutti, L ^a   Patel, N ^a   Brusa, R S ^a  

^a UNIVERSITY OF TRENTO   (Italy)

Author keywords

Positron annihilation spectroscopy; Positronium; Silica

Indexed keywords

MESOPOROUS MATERIALS; POROSITY; POSITRON ANNIHILATION SPECTROSCOPY; POSITRONS; SILICA; TEMPERATURE;

ETHANOL MIXTURES; LOW TEMPERATURES; NANOPOROUS SILICA; POLY VINYL PYRROLIDONE; POSITRONIUM; POSITRONIUM FORMATION; QUENCHING MECHANISMS; SI SUBSTRATES;

THIN FILMS;

EID: 53049087865     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.05.207     Document Type: Article

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