Molecular mechanisms of aluminum oxide thin film growth on polystyrene during atomic layer deposition

Chemistry - A European Journal

Volumn 16, Issue 47, 2010, Pages 13925-13929

  Puttaswamy, Manjunath ^a   Haugshøj, Kenneth Brian ^b   Højslet Christensen, Leif ^b   Kingshott, Peter ^a  

^a AARHUS UNIVERSITY   (Denmark)

^b DANISH TECHNOLOGICAL INSTITUTE   (Denmark)

Author keywords

aluminum oxides; atomic layer deposition; hybrid materials; mass spectrometry; polystyrenes

Indexed keywords

ALUMINUM OXIDE THIN FILMS; ALUMINUM OXIDES; ATOMIC LAYER; GROWTH MECHANISMS; HYBRID INTERFACE; MOLECULAR MECHANISM; POLYSTYRENE MATRIX; TRIMETHYLALUMINUM;

ALUMINUM; ALUMINUM COATINGS; ATOMIC LAYER DEPOSITION; ATOMS; DEPOSITION; HYBRID MATERIALS; MASS SPECTROMETRY; OXIDES; POLYMER BLENDS; POLYSTYRENES;

FILM GROWTH;

EID: 78650263634     PISSN: 09476539     EISSN: 15213765     Source Type: Journal    
DOI: 10.1002/chem.201001888     Document Type: Article

References (25)

1. T. Suntola, Thin Solid Films 1992, 216, 84.
2. S. M. George, A. W. Ott, J. W. Klaus, J. Phys. Chem. 1996, 100, 13121.
3. A. C. Dillon, A. W. Ott, J. D. Way, S. M. George, Surfactant Sci. Ser. 1995, 322, 230.
4. A. W. Ott, J. W. Klaus, J. M. Johnson, S. M. George, Thin Solid Films 1997, 292, 135.
5. M. Ritala, M. Leskela, J. P. Dekker, C. Mutsaers, P. J. Soininen, J. Skarp, Chem. Vap. Deposition 1999, 5, 7.
6. M. L. Green, R. A. Levy, R. G. Nuzzo, E. Coleman, Thin Solid Films 1984, 114, 367.
7. M. Knez, A. Kadri, C. Wege, U. Gosele, H. Jeske, K. Nielsch, Nano Lett. 2006, 6, 1172.
8. L. Niinisto, J. Paivasaari, J. Niinisto, M. Putkonen, M. Nieminen, Phys. Status Solidi A 2004, 201, 1443.
9. A. Sinha, D. W. Hess, C. L. Henderson, J. Vac. Sci. Technol. B 2006, 24, 2523.
10. M. D. Groner, S. M. George, R. S. McLean, P. F. Carcia, Appl. Phys. Lett. 2006, 88, 051907.
11. S. J. Yun, Y. W. Ko, J. W. Lim, Appl. Phys. Lett. 2004, 85, 4896.
12. C. A. Wilson, R. K. Grubbs, S. M. George, Chem. Mater. 2005, 17, 5625.
13. C. A. Wilson, J. A. McCormick, A. S. Cavanagh, D. N. Goldstein, A. W. Weimer, S. M. George, Thin Solid Films 2008, 516, 6175.
14. S. M. Lee, E. Pippel, U. Gosele, C. Dresbach, Y. Qin, C. V. Chandran, T. Brauniger, G. Hause, M. Knez, Science 2009, 324, 488.
15. C. Y. Chang, F. Y. Tsai, S. J. Jhuo, M. J. Chen, Org. Electron. 2008, 9, 667.
16. L. B. Zhang, A. J. Patil, L. Li, A. Schierhorn, S. Mann, U. Gosele, M. Knez, Angew. Chem. 2009, 121, 5082
17. Angew. Chem. Int. Ed. 2009, 48, 4982.
18. A. S. G. Curtis, J. V. Forrester, C. Mcinnes, F. Lawrie, J. Cell Biol. 1983, 97, 1500.
19. E. McCafferty, J. P. Wightman, Surf. Interface Anal. 1998, 26, 549.
20. D. M. Brewis, D. Briggs, R. H. Dahm, I. Fletcher, Surf. Interface Anal. 2000, 29, 572.
21. X. M. Zeng, C. M. Chan, L. T. Weng, L. Li, Polymer 2000, 41, 8321.
22. S. B. Idage, S. Badrinarayanan, Langmuir 1998, 14, 2780.
23. A. Karen, N. Man, T. Shibamori, K. Takahashi, Appl. Surf. Sci. 2003, 203, 541.
24. X. Vanden Eynde, P. Bertrand, J. Penelle, Macromolecules 2000, 33, 5624.
25. J. Davies, C. S. Nunnerley, A. C. Brisley, R. F. Sunderland, J. C. Edwards, P. Kruger, R. Knes, A. J. Paul, S. Hibbert, Colloids Surf. 2000, 174, 287.