Fabrication of mesas with micro- and nanopatterned surface relief used as working stamps for step and stamp imprint lithography

Journal of Vacuum Science and Technology B

Volumn 28, Issue 6, 2010, Pages

  Schleunitz, Arne ^a   Spreu, Christian ^a   Haatainen, Tomi ^b   Klukowska, Anna ^c   Schift, Helmut ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

^c MICRO RESIST TECHNOLOGY GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CURING; FABRICATION; ORGANIC-INORGANIC MATERIALS;

IMPRINT LITHOGRAPHY; MANUFACTURING CONCEPTS; MESA STRUCTURE; MICRO SURFACES; MICROPATTERNED SURFACE; NANO IMPRINT; NANO-PATTERNED SURFACES; SURFACE RELIEFS; THERMAL; WORKING STAMPS;

NANOIMPRINT LITHOGRAPHY;

EID: 78650165346     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3497022     Document Type: Article

References (13)

1. T. Haatainen and J. Ahopelto, Phys. Scr. PHSTBO 0031-8949 67, 357 (2003). 10.1238/Physica.Regular.067a00357
2. T. Haatainen, P. Majander, T. Mäkelä, J. Ahopelto, and Y. Kawaguchi, Jpn. J. Appl. Phys. JJAPA5 0021-4922 47, 5164 (2008). 10.1143/JJAP.47.5164
3. H. Schift, J. Vac. Sci. Technol. B JVTBD9 1071-1023 26, 458 (2008). 10.1116/1.2890972 (Pubitemid 351474145)
4. T. Haatainen, P. Majander, T. Mäkelä, J. Ahopelto, and G. Lecarpentier, NNT 06, International Nanoimprint and Nanoprint Technology Conference, San Francisco, CA, 15-17 November 2006 (unpublished).
5. K. Pfeiffer, M. Fink, G. Gruetzner, G. Bleidiessel, H. Schulz, and H. Scheer, Microelectron. Eng. MIENEF 0167-9317 57-58, 381 (2001). 10.1016/S0167-9317(01)00537-8
6. X. Cheng and L. J. Guo, Microelectron. Eng. MIENEF 0167-9317 71, 277 (2004). 10.1016/j.mee.2004.01.041
7. M. B. Christiansen, F. Arango, M. Schøler, and A. Kristensen, Opt. Express OPEXFF 1094-4087 15, 3931 (2007). 10.1364/OE.15.003931 (Pubitemid 46557555)
8. H. Schift, C. Spreu, A. Schleunitz, J. Gobrecht, A. Klukowska, F. Reuther, and G. Gruetzner, J. Vac. Sci. Technol. B JVTBD9 1071-1023 27, 2850 (2009). 10.1116/1.3250260
9. A. Klukowska, A. Kolander, I. Bergmair, M. Mühlberger, H. Leichtfried, F. Reuther, G. Grützner, and R. Schöftner, Microelectron. Eng. MIENEF 0167-9317 86, 697 (2009). 10.1016/j.mee.2008.12.088
10. See www.microresist.com.
11. H. Schift, C. Spreu, M. Saidani, M. Bednarzik, J. Gobrecht, A. Klukowska, F. Reuther, G. Gruetzner, and H. H. Solak, J. Vac. Sci. Technol. B JVTBD9 1071-1023 27, 2846 (2009). 10.1116/1.3250207
12. H. Lorenz, M. Despont, P. Vettiger, and P. Renaud, Microsyst. Technol. MCTCEF 0946-7076 4, 143 (1998). 10.1007/s005420050118
13. H. Schift, S. Saxer, S. Park, C. Padeste, U. Pieles, and J. Gobrecht, Nanotechnology NNOTER 0957-4484 16, S171 (2005). 10.1088/0957-4484/16/5/007 (Pubitemid 41237394)