Transparent hybrid polymer stamp copies with sub-50-nm resolution for thermal and UV-nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2846-2849

  Schift, Helmut ^a   Spreu, Christian ^a   Saidani, Menouer ^a   Bednarzik, Martin ^a   Gobrecht, Jens ^a   Klukowska, Anna ^b   Reuther, Freimut ^b   Gruetzner, Gabi ^b   Solak, Harun H ^c  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b MICRO RESIST TECHNOLOGY GMBH   (Germany)

^c EULITHA AG   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

HYBRID POLYMERS; IMPRINT TEMPERATURE; NM RESOLUTION; ORGANIC-INORGANIC HYBRID POLYMER; PLASMA TREATMENT; RECOATING; STAMP COPY; SURFACE RELIEFS; THERMOPLASTIC MATERIALS; UV EXPOSURE; UV NANOIMPRINT LITHOGRAPHY; WORKING STAMPS;

HYBRID MATERIALS; PLASMA APPLICATIONS;

NANOIMPRINT LITHOGRAPHY;

EID: 72849131672     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3250207     Document Type: Conference Paper

References (7)

1. H. Schift, J. Vac. Sci. Technol. B 26, 458 (2008).
2. A. Klukowska, M. Vogler, A. Kolander, F. Reuther, G. Gruetzner, M. Muehlberger, I. Bergmair, and R. Schoeftner, Proc. SPIE 6792, 67920J (2008).
3. A. Klukowska, A. Kolander, I. Bergmair, M. Mühlberger, H. Leichtfried, F. Reuther, G. Grützner, and R. Schöftner, Microelectron. Eng. 86, 697 (2009).
4. H. Schift, S. Saxer, S. Park, C. Padeste, U. Pieles, and J. Gobrecht, Nanotechnology 16, S171 (2005).
5. M. Mühlberger et al., Microelectron. Eng. 86, 691 (2009).
6. S. Park, H. Schift, H. H. Solak, and J. Gobrecht, J. Vac. Sci. Technol. B 22, 3246 (2004).
7. N. Koo, U. Plachetka, M. Otto, J. Bolten, J. -H. Jeong, E. -S. Lee, and H. Kurz, Nanotechnology 19, 225304 (2008).