Imprinted 50 nm features fabricated by step and stamp UV imprinting

Japanese Journal of Applied Physics

Volumn 47, Issue 6 PART 2, 2008, Pages 5164-5166

  Haatainen, Tomi ^a   Majander, Päivi ^a   Mäkelä, Tapio ^a   Ahopelto, Jouni ^a   Kawaguchi, Yasuhide ^b  

^a VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

^b Asahi Class Co Ltd   (Japan)

Author keywords

Imprinting; Nanoimprinting; SSIL; UV NIL; UV SSIL

Indexed keywords

ABS RESINS; ELECTRON BEAM LITHOGRAPHY; FABRICATION; HYDRODYNAMICS; LIGHT SENSITIVE MATERIALS; MICROSCOPIC EXAMINATION; OXIDE MINERALS; POLYMERS; QUARTZ; SILICON; THERMAL EXPANSION; THERMAL SPRAYING; VISCOSITY;

IMPRINTING; NANOIMPRINTING; SSIL; UV-NIL; UV-SSIL;

SUBSTRATES;

EID: 55049087893     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.5164     Document Type: Article

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