Pattern transfer using step&stamp imprint lithography

Physica Scripta

Volumn 67, Issue 4, 2003, Pages 357-360

  Haatainen, T ^a   Ahopelto, J ^a  

^a VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; GLASS TRANSITION; PRINTING; SILICON WAFERS; THERMOPLASTICS; WSI CIRCUITS;

PATTERN TRANSFER;

LITHOGRAPHY;

ETCHING; LITHOGRAPHY; SILICON; THERMOPLASTICS;

EID: 0037397630     PISSN: 00318949     EISSN: None     Source Type: Journal    
DOI: 10.1238/Physica.Regular.067a00357     Document Type: Article

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