Atmospheric pressure chemical vapour deposition of TiCl4 and tBuAsH2 to form titanium arsenide thin films

European Journal of Inorganic Chemistry

Volumn , Issue 36, 2010, Pages 5629-5634

  Thomas, Tegan ^a   Blackman, Christopher S ^a   Parkin, Ivan P ^a   Carmalt, Claire J ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

Arsenic; Chemical vapour deposition; Thin films; Titanium

Indexed keywords

ARSENIC COMPOUNDS; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; CHLORINE COMPOUNDS; DEPOSITION RATES; METAL SUBSTRATES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY POWDER DIFFRACTION;

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; CHEMICAL VAPOUR DEPOSITION; DEPOSITED FILMS; DISPERSIVE ANALYSIS; ISLANDS GROWTH; RAMAN MICROSCOPY; SUBSTRATES TEMPERATURE; THIN-FILMS; TITANIA; WAVELENGTH DISPERSIVE;

ARSENIC;

EID: 78650160607     PISSN: 14341948     EISSN: 10990682     Source Type: Journal    
DOI: 10.1002/ejic.201000839     Document Type: Article

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