Atmospheric-pressure CVD of Vanadium Phosphide thin films from reaction of Tetrakisdimethylamidovanadium and Cyclohexylphosphine

Chemical Vapor Deposition

Volumn 10, Issue 5, 2004, Pages 253-255

  Blackman, Christopher S ^a   Carmalt, Claire J ^a   O'Neill, Shane A ^a   Parkin, Ivan P ^a   Molloy, Kieran C ^b   Apostolico, Leonardo ^b  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b University of Bath   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; CRYSTALLOGRAPHY; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

METAL PHOSPHIDE COATINGS; TRANSITION METAL PHOSPHIDES; VANADIUM CARBONITRIDE FILMS;

VANADIUM COMPOUNDS;

EID: 10444257306     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200304174     Document Type: Article

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