Chemical vapour deposition of crystalline thin films of tantalum phosphide

Materials Letters

Volumn 57, Issue 18, 2003, Pages 2634-2636

  Blackman, C S ^a   Carmalt, C J ^a   Parkin, I P ^a   O'Neill, S A ^a   Molloy, K C ^b   Apostolico, L ^b  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b University of Bath   (United Kingdom)

Author keywords

Barrier layer; Chemical resistance; Chemical vapour deposition; Hard; Tantalum phosphide; Thin film

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; INFRARED RADIATION; THIN FILMS;

CYSTALLINE THIN FILMS;

TANTALUM COMPOUNDS;

EID: 0037989108     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(02)01341-1     Document Type: Article

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