The reaction of GeCl4 with primary and secondary phosphines

Journal of the Chemical Society. Dalton Transactions

Volumn 4, Issue 3, 2004, Pages 470-475

  Apostolico, Leonardo ^a   Mahon, Mary F ^a   Molloy, Kieran C ^a   Binions, Russell ^b   Blackman, Christopher S ^b   Carmalt, Claire J ^b   Parkin, Ivan P ^b  

^a University of Bath Claverton Down   (United Kingdom)

^b UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

Chemical vapour deposition; Germanium; Main group chemistry; P, N, S, Se, O, Te, Si containing ligands; X ray diffraction, X ray powder diffraction

Indexed keywords

AEROSOLS; CRYSTAL STRUCTURE; CRYSTALS; GERMANIUM; GERMANIUM COMPOUNDS; NEGATIVE IONS; OXYGEN; PHOSPHORUS; PHOSPHORUS COMPOUNDS; POSITIVE IONS; THIN FILMS;

AEROSOL ASSISTED CHEMICAL VAPOR DEPOSITION; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; PHOSPHINES; PHOSPHONIUM;

CHEMICAL VAPOR DEPOSITION;

CHLORIDE; GERMANIUM; ORGANOMETALLIC COMPOUND; PHOSPHINE DERIVATIVE;

ARTICLE; CHEMICAL STRUCTURE; CHEMISTRY; SYNTHESIS; X RAY CRYSTALLOGRAPHY;

CHLORIDES; CRYSTALLOGRAPHY, X-RAY; GERMANIUM; MODELS, MOLECULAR; MOLECULAR STRUCTURE; ORGANOMETALLIC COMPOUNDS; PHOSPHINES;

EID: 1242333222     PISSN: 14779226     EISSN: None     Source Type: Journal    
DOI: 10.1039/b315378a     Document Type: Article

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