Chemical vapour deposition of group Vb metal phosphide thin films

Journal of Materials Chemistry

Volumn 13, Issue 8, 2003, Pages 1930-1935

  Blackman, C S ^a   Carmalt, C J ^a   O'Neill, S A ^a   Parkin, I P ^a   Molloy, K C ^b   Apostolico, L ^b  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b University of Bath   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ATMOSPHERIC PRESSURE; CHEMICAL RESISTANCE; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; STOICHIOMETRY; SUBSTRATES; VANADIUM COMPOUNDS;

SUBSTRATE TEMPERATURES;

THIN FILMS;

NIOBIUM; PHOSPHINE DERIVATIVE; TANTALUM; VANADIUM DERIVATIVE;

ARTICLE; ATMOSPHERIC PRESSURE; CRYSTALLIZATION; ELECTRON PROBE MICROANALYSIS; FILM; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; TEMPERATURE DEPENDENCE; VAPOR; X RAY POWDER DIFFRACTION;

EID: 0042066722     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/b304084b     Document Type: Article

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