Microfabricated resistive high-sensitivity nanoprobe for scanning thermal microscopy

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 28, Issue 6, 2010, Pages

  Wielgoszewski, G ^a   Sulecki, P ^a   Gotszalk, T ^a   Janus, P ^b   Szmigiel, D ^b   Grabiec, P ^b   Zschech, E ^c  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

^b ukasiewicz Research Network Institute of Microelectronics and Photonics   (Poland)

^c FRAUNHOFER INSTITUTE FOR NON DESTRUCTIVE TESTING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BRIDGE CIRCUITS; METALLIC COMPOUNDS; MICROFABRICATION; MOS DEVICES; NANOCANTILEVERS; NANOPROBES; PLATINUM; PROBES; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON NITRIDE;

ATOMIC FORCE MICROSCOPES; CANTILEVER FABRICATION; COMPLEMENTARY METAL-OXIDE-SEMICONDUCTOR TECHNOLOGIES; FOUR-POINT; HIGH REPRODUCIBILITY; HIGH RESOLUTION; HIGH-SENSITIVITY; MEASUREMENT SETUP; MICROFABRICATED; OPTICAL DETECTION SYSTEM; SCANNING THERMAL MICROSCOPE; SCANNING THERMAL MICROSCOPY; THERMAL SENSING; THERMO-RESISTIVE; THOMSON; WHEATSTONE BRIDGES;

SCANNING;

EID: 78650146641     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3502614     Document Type: Article

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