Cobalt silicide nanocables grown on Co films: Synthesis and physical properties

Nanotechnology

Volumn 21, Issue 48, 2010, Pages

  Hsin, Cheng Lun ^a   Yu, Shih Ying ^a   Wu, Wen Wei ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AIR AMBIENT; CATALYSIS PROCESS; CO FILMS; CO THIN FILMS; COBALT SILICIDE; CONFINED SPACE; ELECTRICAL PROPERTY; KEY COMPONENT; MAXIMUM CURRENT DENSITY; NANOCABLES; OXIDE SHELL; SILICATE COMPOUNDS; SILICATE NANOWIRES; SILICIDE NANOWIRES; SINGLE-CRYSTALLINE; THERMAL STABILITY; VAPOR-LIQUID-SOLID MECHANISM;

AGGLOMERATION; COBALT; COBALT COMPOUNDS; ELECTRIC PROPERTIES; ELECTRIC WIRE; NANOWIRES; OXYGEN; SILICATES; SILICON OXIDES; THERMODYNAMIC STABILITY; THIN FILMS;

SILICIDES;

EID: 78650101132     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/48/485602     Document Type: Article

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