Thermally-induced formation of hexagonal AlN in AlCrN hard coatings on sapphire: Orientation relationships and residual stresses

Surface and Coatings Technology

Volumn 205, Issue 5, 2010, Pages 1320-1323

  Bartosik, M ^a   Daniel, R ^b   Mitterer, C ^b   Keckes, J ^a  

^a Erich Schmid Institute of Materials Science   (Austria)

^b INSTITUTE FOR MICROELECTRONICS   (Austria)

Author keywords

AlCrN; Phase transformation; Pole figure; Residual stress; XRD

Indexed keywords

ALCRN; ALN; ATOMIC RATIO; DEFECT RECOVERY; DEPOSITION TEMPERATURES; EPITAXIALLY GROWN; HEXAGONAL WURTZITE; ORIENTATION RELATIONSHIP; PHASE TRANSFORMATION; POLE FIGURE; POLE FIGURE MEASUREMENTS; REACTIVE MAGNETRON SPUTTERING; STRESS CHANGES; WURTZITES; X-RAY DIFFRACTION TECHNIQUES; XRD;

ALUMINUM; ANNEALING; CHROMATE COATINGS; CHROMIUM; POINT DEFECTS; POLES; RESIDUAL STRESSES; SUBSTRATES; X RAY DIFFRACTION; ZINC SULFIDE;

HARD COATINGS;

EID: 78649939540     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.08.089     Document Type: Article

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