Characterization of an inductively amplified magnetron plasma by glow discharge mass spectrometry

Vacuum

Volumn 53, Issue 1-2, 1999, Pages 17-20

  Molle, C ^a   Beauvois, A ^a   Wautelet, M ^a   Dauchot, J P ^a   Hecq, M ^a  

^a UNIVERSITY OF MONS   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; ELECTRON ENERGY LEVELS; ELECTRONS; GLOW DISCHARGES; IONIZATION; IONS; MAGNETRONS; MASS SPECTROMETRY; SPUTTER DEPOSITION; VAPOR PRESSURE;

ARGON PRESSURE; DIRECT CURRENT MAGNETRON DISCHARGE; GLOW DISCHARGES MASS SPECTROMETRY; INDUCTIVELY AMPLIFIED PLASMA; ION ENERGY DISTRIBUTIONS; RADIO FREQUENCY INDUCTION POWER;

PLASMAS;

EID: 0033132059     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(98)00413-8     Document Type: Article

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