Investigation on the abnormal resistive switching induced by ultraviolet light exposure based on HfOx film

Microelectronics Reliability

Volumn 50, Issue 12, 2010, Pages 1931-1934

  Chang, Kow Ming ^a   Tzeng, Wen Hsien ^a   Liu, Kou Chen ^b   Chan, Yi Chun ^b   Kuo, Chun Chih ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b CHANG GUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL ISSUES; ELECTRICAL CHARACTERISTIC; ELECTRICAL PROPERTY; FORMING PROCESS; I - V CURVE; NETWORK SIMULATION; RESET VOLTAGE; RESISTIVE SWITCHING; SWITCHING CHARACTERISTICS; ULTRA-VIOLET LIGHT; ULTRAVIOLET LIGHTS; UV LASER EXPOSURE;

COMPUTER SIMULATION; ELECTRIC PROPERTIES; SWITCHING SYSTEMS; ULTRAVIOLET RADIATION;

CURRENT VOLTAGE CHARACTERISTICS;

EID: 78649448172     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2010.05.012     Document Type: Article

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