Directed self-assembly by photostimulation of an amorphous semiconductor surface

AIChE Journal

Volumn 56, Issue 12, 2010, Pages 3206-3211

  Kondratenko, Yevgeniy V ^a   Seebauer, Edmund G ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

Chemical vapor deposition; Directed self assembly; Nanofabrication; Photostimulated diffusion; Titanium oxide

Indexed keywords

AMORPHOUS TIO; BOTTOM UP APPROACH; DIRECTED SELF-ASSEMBLY; ELECTRON-BEAM EXPOSURE; NANO SCALE; NANOFABRICATION; PHOTOSTIMULATED DIFFUSION; PHOTOSTIMULATION; SELF-ORGANIZATIONS; SUBCRITICAL NUCLEI; TOPDOWN; ULTRA-VIOLET LIGHT;

AMORPHOUS SEMICONDUCTORS; CHEMICAL VAPOR DEPOSITION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; SELF ASSEMBLY; TITANIUM; ULTRAVIOLET RADIATION;

TITANIUM OXIDES;

EID: 78349253048     PISSN: 00011541     EISSN: 15475905     Source Type: Journal    
DOI: 10.1002/aic.12229     Document Type: Article

References (43)

1. Blau WJ, Fleming AJ. Designer nanotubes by molecular self-assembly. Science. 2004; 304: 1457-1458.
2. Xia D, Biswas A, Li D, Brueck SRJ. Directed self-assembly of silica nanoparticles into nanometer-scale patterned surfaces using spin-coating. Adv Mater. 2004; 16: 1427-1432.
3. x nanoparticles on UV/ozone micropatterned poly(dimethylsiloxane) films. Adv Mater. 2000; 12: 1257-1261.
4. Vikholm I. Self-assembly of antibody fragments and polymers onto gold for immunosensing. Sens Actuators B: Chem. 2005; 106: 311-316.
5. Zheng W, Jacobs HO. Self-assembly process to integrate and connect semiconductor dies on surfaces with single-angular orientation and contact-pad registration. Adv Mater. 2006; 18: 1387-1392.
6. Gracias DH, Tien J, Breen TL, Hsu C, Whitesides GM. Forming electrical networks in three dimensions by self-assembly. Science. 2000; 289: 1170-1172.
7. Ditchfield R, Llera-Rodriguez D, Seebauer EG. Nonthermal effects of photon illumination on surface diffusion. Phys Rev Lett. 1998; 81: 1259-1262.
8. Ditchfield R, Llera-Rodriguez D, Seebauer EG. Semiconductor surface diffusion: nonthermal effects of photon illumination. Phys Rev B. 2000; 61: 13710-13720.
9. Diehl F, Herbst W, Bauer S, Schroder B, Oechsner H. Creation of metastable defects in a-Si:H by keV-electron irradiation at different temperatures. J Non-Cryst Solids. 1996; 198-200(Part 1): 436-440.
10. Watanabe H, Tatsumi T, Ikarashi T, Sakai A, Aoto N, Kikkawa T. An advanced technique for fabricating hemispherical-grained (HSG) silicon storage electrodes. Electron Devices IEEE Trans. 1995; 42: 295-300.
11. Suzuki K. Hemispherical-grained LPCVD-polysilicon films for use in MEMS applications. Sensors Actuators A: Phys. 2000; 79: 141-146.
12. Joannopoulos JD. The almost magical world of photonic crystals. Proc IEEE Lasers Electro-Optics Soc. 1999; 1: 232-233.
13. Leonard SW, Busch K, John S, van Driel HM, Birner A, Gosele U. Dependence of transmission on number of rows of 2-D macroporous silicon photonic band gap material. In: IQEC, International Quantum Electronics Conference Proceedings. 1999: 267-268.
14. Treacy MMJ, Gibson JM, Keblinski PJ. Paracrystallites found in evaporated amorphous tetrahedral semiconductors. J Non-Cryst Solids. 1998; 231: 99-110.
15. Treacy MMJ, Voyles PM, Gibson JM. Schlafli cluster topological analysis of medium range order in paracrystalline amorphous semiconductor models. J Non-Cryst Solids. 2000; 266-269(Part 1): 150-155.
16. Bodapati A, Treacy MMJ, Falk M, Kieffer J, Keblinski P. Medium range order and the radial distribution function. J Non-Cryst Solids. 2006; 352: 116-122.
17. Gaskell PH. Medium-range structure in glasses and low-Q structure in neutron and X-ray scattering data. J Non-Cryst Solids. 2005; 351: 1003-1013.
18. Fan C, Wilson TW, Dmowski W, Choo H, Richardson JW, Maxey ER, Liaw PK. Quenched-in quasicrystal medium-range order and pair distribution function study on Zr55Cu35Al10 bulk metallic glass. Intermetallics. 2006; 14: 888-892.
19. Conradt R. Chemical structure, medium range order, and crystalline reference state of multicomponent oxide liquids and glasses. J Non-Cryst Solids. 2004; 345-346: 16-23.
20. Yu KM, Walukiewicz W, Muto S, Jin H-C, Abelson JR. The effects of x-ray induced structural changes on the microstructure of a-Si after thermal crystallization. Appl Phys Lett. 1999; 75: 2032-2034.
21. Voyles PM, Gerbi JE, Treacy MMJ, Gibson JM, Abelson JR. Increased medium-range order in amorphous silicon with increased substrate temperature. J Non-Cryst Solids. 2001; 293-295: 45-52.
22. Schultz KA, Seebauer EG. Surface diffusion of Sb on Ge(111) monitored quantitatively with optical second harmonic microscopy. J Chem Phys. 1992; 97: 6958-6967.
23. Winer K, Ley L. Near-surface electronic properties of a-Si:H. In: Fritzsche H, editor. Amorphous Silicon and Related Materials. Singapore: World Scientific Publication, 1989: 365.
24. Pickup DM, Sowrey FE, Drake KO, Smith ME, Newport RJ. New insights into medium-range order around titanium in sol-gel derived silica through isotope difference neutron diffraction and reverse Monte Carlo modelling. Chem Phys Lett. 2004; 392: 503-507.
25. Seebauer EG, Allen CE. Estimating surface diffusion coefficients. Prog Surf Sci. 1995; 49: 265-330.
26. Dalton AS, Llera-Hurlburt D, Seebauer EG. Surface diffusion kinetics on amorphous silicon. Surf Sci. 2001; 494: L761-L766.
27. Llera-Hurlburt D, Dalton AS, Seebauer EG. Temperature-dependent surface diffusion parameters on amorphous materials. Surf Sci. 2002; 504: 244-252.
28. Dalton AS. Grain nucleation and growth on amorphous silicon. University of Illinois, Urbana-Champaign, 2005.
29. Lu N, Gleiche M, Zheng J, Lenhert S, Xu B, Chi L, Fuchs H. Fabrication of chemically patterned surfaces based on template-directed self-assembly. Adv Mater. 2002; 14: 1812-1815.
30. Kan EC, Liu Z. Directed self-assembly process for nano-electronic devices and interconnect. Superlattices Microstruct. 2000; 27: 473-479.
31. Anderson ME, Srinivasan C, Hohman JN, Carter EM, Horn MW, Weiss PS. Combining conventional lithography with molecular self-assembly for chemical patterning. Advanced Materials. 2006; 18: 3258-3260.
32. Qian L, Teng F, Yang S, Quan S. Mixed excitation mechanism in solid-state cathodoluminescence structure. Chem Phys Lett. 2005; 405: 389-392.
33. Musil CR, Jeggle D, Lehmann HW, Scandella L, Gobrecht J, Dobeli M. Nanostructuring of gold electrodes for immunosensing applications. J Vacuum Sci Technol B. 1995; 13: 2781-2786.
34. Yae S, Inakanishi I, Nakato Y, Toshima N, Mori H. Preparation of a langmuir-blodgett layer of ultrafine platinum particles and its application to N-Si for efficient photoelectrochemical solar-cells. J Electrochem Soc. 1994; 141: 3077-3081.
35. O'Barr R, Yamamoto SY, Schultz S, Weihua X, Scherer A. Fabrication and characterization of nanoscale arrays of nickel columns. J Appl Phys. 1997; 81: 4730-4732.
36. Datta S, Janes DB, Andres RP, Kubiak CP, Reifenberger RG. Molecular ribbons. Semicond Sci Technol. 1998; 13: 1347-1353.
37. Kan EC, Liu ZT. Directed self-assembly process for nano-electronic devices and interconnect. Superlattices Microstruct. 2000; 27: 473-479.
38. Fitz-Gerald J, Singh RK. Novel method for synthesis of engineering particulates with thin coatings. Surf Controlled Nanoscale Mater High Value Add Appl. 1998; 501: 363-368.
39. Gratzel M. Photovoltaics: state of the art and perspectives for nanocrystalline injection cells. EI Elektrotechnik und Informationstechnik. 1997; 114: 579-586.
40. Scalora M, Bloemer MJ, Bowden CM. Metals under a new light. Optics Phototonics News. 1999; 10: 24-27.
41. Vacassy R, Houriet R, Plummer CJC, Dutta J, Hoffmann H. Tin dioxide nanopowders for gas sensor applications. Surf Controlled Nanoscale Mater High Value Add Appl. 1998; 501: 41-46.
42. Pileni MP. Fabrication and properties of nanosized material made by using colloidal assemblies as templates. Cryst Res Technol. 1998; 33: 1155-1186.
43. Lin KH, Crocker JC, Prasad V, Schofield A, Weitz DA, Lubensky TC, Yodh AG. Entropically driven colloidal crystallization on patterned surfaces. Phys Rev Lett. 2000; 85: 1770-1773.