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Surface Science

Volumn 504, Issue , 2002, Pages 244-252

Temperature-dependent surface diffusion parameters on amorphous materials

(3) Llera Hurlburt, D a Dalton, A S a Seebauer, E G a

a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN (United States)

Author keywords

Amorphous surfaces; Computer simulations; Diffusion and migration; Models of surface kinetics; Silicon; Surface diffusion

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS SILICON; COMPUTER SIMULATION; DIFFUSION;

AMORPHOUS SURFACES;

SURFACE PHENOMENA;

EID: 0037140061 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(02)01106-8 Document Type: Article

Times cited : (15)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.