Hemispherical-grained LPCVD-polysilicon films for use in MEMS applications

Sensors and Actuators, A: Physical

Volumn 79, Issue 2, 2000, Pages 141-146

  Suzuki, Kenichiro ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CRYSTALLIZATION; INTERFACES (MATERIALS); MICROELECTROMECHANICAL DEVICES; MICROSENSORS; POLYCRYSTALLINE MATERIALS; RESIDUAL STRESSES; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SILICA; SURFACE ROUGHNESS; TENSILE STRESS;

POLYSILICON FILMS;

SILICON SENSORS;

EID: 0033879159     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(99)00274-5     Document Type: Article

References (12)

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