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Surface Science

Volumn 494, Issue 1, 2001, Pages L761-L766

Surface diffusion kinetics on amorphous silicon

(3) Dalton, A S a Llera Hurlburt, D a Seebauer, E G a

a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN (United States)

Author keywords

Amorphous surfaces; Computer simulations; Diffusion and migration; Models of surface kinetics; Silicon; Surface diffusion

Indexed keywords

ACTIVATION ENERGY; COMPUTER SIMULATION; DIFFUSION; GRAIN GROWTH; MASS TRANSFER; SURFACE PHENOMENA; THERMAL EFFECTS;

AMORPHOUS SURFACES; SURFACE DIFFUSIONS;

AMORPHOUS SILICON;

EID: 0035841377 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(01)01493-5 Document Type: Article

Times cited : (12)

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