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Journal of Alloys and Compounds

Volumn 509, Issue 2, 2011, Pages 384-386

The effect of NH3 concentrations on the electrical properties of N-doped ZnO and study on mechanism

(3) Li Dan, Tang a Bing, Wang a Yue, Zhang b

a LIAONING UNIVERSITY OF TECHNOLOGY (China)

b UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING (China)

Author keywords

Electrical properties; Sputtering; Thin films

Indexed keywords

ELECTRICAL PROPERTY; HALL MEASUREMENTS; N-DOPED; P-TYPE ZNO FILM; PREFERENTIAL ORIENTATION; RF-MAGNETRON SPUTTERING; SEM; WURZITE; XPS; XPS MEASUREMENTS; XRD; ZNO FILMS;

MAGNETRON SPUTTERING; METALLIC FILMS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

ELECTRIC PROPERTIES;

EID: 78149283203 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2010.09.032 Document Type: Article

Times cited : (13)

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