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Volumn 273, Issue 3-4, 2005, Pages 451-457

P-type Zno thin films fabricated by Al-N co-doping method at different substrate temperature

(6) Yuan, Guodong a Ye, Zhizhen a Qian, Qing a Zhu, Liping a Huang, Jingyun a Zhao, Binghui a

Author keywords

A1. Co doping; A1. P type conduction; A3. DC magnetron reactive sputtering; B1. Zinc compounds; B2. Semiconducting II VI materials

Indexed keywords

CONCENTRATION (PROCESS); LIGHT EMITTING DIODES; MAGNETRON SPUTTERING; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR MATERIALS; SUBSTRATES; THIN FILMS; ULTRAVIOLET RADIATION; X RAY DIFFRACTION ANALYSIS;

CO-DOPING; DC MAGNETRON REACTIVE SPUTTERING; P-TYPE CONDUCTION; SEMICONDUCTING II-VI MATERIALS;

ZINC COMPOUNDS;

EID: 10644261283 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcrysgro.2004.09.042 Document Type: Article

Times cited : (12)

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