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Volumn 312, Issue 24, 2010, Pages 3599-3602
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Crystallization of sputtered amorphous silicon induced by silvercopper alloy with high crystalline volumeratio
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Author keywords
A1. Recrystallization; A3. Alloy induced crystallization; A3. Magnetron sputtering; B1. Polycrystalline silicon; B1. Semiconducting silicon
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Indexed keywords
A3. ALLOY-INDUCED CRYSTALLIZATION;
A3. MAGNETRON SPUTTERING;
B1. SEMICONDUCTING SILICON;
POLY-CRYSTALLINE SILICON;
RECRYSTALLIZATIONS;
COPPER ALLOYS;
CRYSTALLIZATION;
GALVANOMAGNETIC EFFECTS;
HALL MOBILITY;
OHMIC CONTACTS;
POLYCRYSTALLINE MATERIALS;
POLYSILICON;
RECRYSTALLIZATION (METALLURGY);
SEMICONDUCTING SILICON;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON ALLOYS;
SILVER;
SILVER ALLOYS;
AMORPHOUS SILICON;
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EID: 78149281732
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2010.09.068 Document Type: Article |
Times cited : (8)
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References (19)
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