메뉴 건너뛰기




Volumn 82, Issue 15, 2010, Pages

Impurity doping in SiO2: Formation energies and defect levels from first-principles calculations

Author keywords

[No Author keywords available]

Indexed keywords


EID: 78149269024     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.82.155132     Document Type: Article
Times cited : (47)

References (51)
  • 1
    • 0003641685 scopus 로고    scopus 로고
    • edited by G. Pacchioni, L. Skuja, and D. L. Griscom (Kluwer Academic, Dordrecht
    • Defects in SiO 2 and Related Dielectrics: Science and Technology, edited by, G. Pacchioni,,, L. Skuja,, and, D. L. Griscom, (Kluwer Academic, Dordrecht, 2000).
    • (2000) Defects in SiO2 and Related Dielectrics: Science and Technology
  • 3
    • 84876191477 scopus 로고    scopus 로고
    • 10.1038/nphys1454
    • E. Gerstner, Nat. Phys. 5, 780 (2009). 10.1038/nphys1454
    • (2009) Nat. Phys. , vol.5 , pp. 780
    • Gerstner, E.1
  • 16
    • 65149102692 scopus 로고    scopus 로고
    • 10.1103/PhysRevB.79.165201
    • C.-L. Kuo and G. S. Hwang, Phys. Rev. B 79, 165201 (2009). 10.1103/PhysRevB.79.165201
    • (2009) Phys. Rev. B , vol.79 , pp. 165201
    • Kuo, C.-L.1    Hwang, G.S.2
  • 23
    • 33845453636 scopus 로고    scopus 로고
    • 10.1063/1.2397021
    • J. Li and Z. Y. Fan, Appl. Phys. Lett. 89, 213510 (2006). 10.1063/1.2397021
    • (2006) Appl. Phys. Lett. , vol.89 , pp. 213510
    • Li, J.1    Fan, Z.Y.2
  • 25
    • 10644250257 scopus 로고
    • 10.1103/PhysRev.136.B864
    • P. Hohenberg and W. Kohn, Phys. Rev. 136, B864 (1964). 10.1103/PhysRev.136.B864
    • (1964) Phys. Rev. , vol.136 , pp. 864
    • Hohenberg, P.1    Kohn, W.2
  • 26
    • 0042113153 scopus 로고
    • 10.1103/PhysRev.140.A1133
    • W. Kohn and L. J. Sham, Phys. Rev. 140, A1133 (1965). 10.1103/PhysRev.140.A1133
    • (1965) Phys. Rev. , vol.140 , pp. 1133
    • Kohn, W.1    Sham, L.J.2
  • 27
    • 2442537377 scopus 로고    scopus 로고
    • 10.1103/PhysRevB.54.11169
    • G. Kresse and J. Furthmuller, Phys. Rev. B 54, 11169 (1996). 10.1103/PhysRevB.54.11169
    • (1996) Phys. Rev. B , vol.54 , pp. 11169
    • Kresse, G.1    Furthmuller, J.2
  • 28
    • 25744460922 scopus 로고
    • 10.1103/PhysRevB.50.17953
    • P. E. Blöchl, Phys. Rev. B 50, 17953 (1994). 10.1103/PhysRevB.50. 17953
    • (1994) Phys. Rev. B , vol.50 , pp. 17953
    • Blöchl, P.E.1
  • 29
    • 18144378706 scopus 로고
    • 10.1103/PhysRevB.33.8800
    • J. P. Perdew and Y. Wang, Phys. Rev. B 33, 8800 (1986). 10.1103/PhysRevB.33.8800
    • (1986) Phys. Rev. B , vol.33 , pp. 8800
    • Perdew, J.P.1    Wang, Y.2
  • 33
  • 36
    • 0037009055 scopus 로고    scopus 로고
    • 10.1088/0953-8984/14/34/201
    • S. B. Zhang, J. Phys.: Condens. Matter 14, R881 (2002). 10.1088/0953-8984/14/34/201
    • (2002) J. Phys.: Condens. Matter , vol.14 , pp. 881
    • Zhang, S.B.1
  • 41
    • 0003998388 scopus 로고    scopus 로고
    • edited by D. R. Lide (CRC Press, Boca Raton, Florida
    • CRC Handbook of Chemistry and Physics, edited by, D. R. Lide, (CRC Press, Boca Raton, Florida, 2004).
    • (2004) CRC Handbook of Chemistry and Physics
  • 42
    • 0003760432 scopus 로고    scopus 로고
    • edited by R. Hull (INSPEC, The Institution of Electrical Engineers, London
    • Properties of Crystalline Silicon, edited by, R. Hull, (INSPEC, The Institution of Electrical Engineers, London, 1999).
    • (1999) Properties of Crystalline Silicon
  • 43
    • 0041705132 scopus 로고    scopus 로고
    • 10.1063/1.1584074
    • A. Zunger, Appl. Phys. Lett. 83, 57 (2003). 10.1063/1.1584074
    • (2003) Appl. Phys. Lett. , vol.83 , pp. 57
    • Zunger, A.1
  • 50
    • 0142219832 scopus 로고    scopus 로고
    • 10.1103/PhysRevLett.91.126406
    • D. Segev and S.-H. Wei, Phys. Rev. Lett. 91, 126406 (2003). 10.1103/PhysRevLett.91.126406
    • (2003) Phys. Rev. Lett. , vol.91 , pp. 126406
    • Segev, D.1    Wei, S.-H.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.