Growth and structural characterizations of nanostructured chromium-zirconium-nitride thin films for tribological applications

Materials Transactions

Volumn 51, Issue 9, 2010, Pages 1651-1655

  Homhuan, Pattira ^a   Chaiyakun, Surasing ^b   Thonggoom, Rattaporn ^c   Panich, Nurot ^a   Tungasmita, Sukkaneste ^a  

^a CHULALONGKORN UNIVERSITY   (Thailand)

^b BURAPHA UNIVERSITY   (Thailand)

^c Mahidol University   (Thailand)

Author keywords

Hard coating; Magnetron sputtering; Nanostructure; Protective thin films

Indexed keywords

AVERAGE GRAIN SIZE; COMPETITIVE GROWTH; CRYSTAL TEXTURE; DEFECT LEVELS; ELECTRICAL PROPERTY; GRAIN SIZE; NANO-STRUCTURED; NITRIDE THIN FILMS; NITROGEN PARTIAL PRESSURES; POST ANNEALING; PROTECTIVE THIN; REDUCED MODULUS; ROOT MEAN SQUARE ROUGHNESS; SI (100) SUBSTRATE; STRUCTURAL CHARACTERIZATION; TRIBOLOGICAL APPLICATIONS; X-RAY DIFFRACTOGRAMS; ZRN FILMS;

AMORPHOUS FILMS; CHROMIUM; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; FILM GROWTH; GRAIN SIZE AND SHAPE; HARD COATINGS; MECHANICAL PROPERTIES; NITRIDES; NITROGEN; PARTIAL PRESSURE; PROTECTIVE COATINGS; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS; VAPOR DEPOSITION; ZIRCONIUM;

NANOSTRUCTURES;

EID: 78049506961     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.M2010140     Document Type: Article

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