Characteristics of a well-adherent nanocrystalline diamond thin film grown on titanium in Ar/CH4 microwave CVD plasma

Vacuum

Volumn 82, Issue 6, 2008, Pages 673-677

  Jawid Askari, S ^a,b   Lu, Fanxiu ^b  

^a NATIONAL UNIVERSITY OF SCIENCES AND TECHNOLOGY   (Pakistan)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

Author keywords

Adhesion; Argon; Chemical vapor deposition; Nanocrystalline diamond thin film; Titanium substrate

Indexed keywords

ARGON; CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; MICROWAVES; NANOCRYSTALLINE MATERIALS; THIN FILMS; TITANIUM;

NANOCRYSTALLINE DIAMOND THIN FILMS; TITANIUM SUBSTRATES;

FILM GROWTH;

EID: 38849191130     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2007.08.013     Document Type: Article

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